Argon Fluoride (ArF) and Krypton Fluoride (KrF) polymers
These functionalized polymers are used to create patterns in the photoresist process. KISCO supplies high quality products tailored to customer requirements.
Photo Acid Generator (PAG)
PAGs generate acids when exposed to light of a specific wavelength. KISCO supplies various PAG products including Sulfonium-type and Iodonium-type PAGs that are used for i-line, KrF and ArF photoresists.
Resins for Bottom Anti-Reflection Coating (BARC)
BARCs prevent the reflection of light by the lower film layer during exposure in semiconductor photo processes. KISCO produces and supplies resins for i-line BARC, ArF BARC and KrF BARC.
KISCO manufacturers high-quality and price competitive monomers for a range of applications.