KISCO develops and manufactures a wide range of high quality materials for use in various aspects of electronics. Many of these materials are sold into the supply chains of the major Korean electronics companies as well as to other partners throughout Asia.

 

Photoresists

High performance, low-cost KrF and ArF monomers
Diazonaphthoquinone/polyhydroxy phenol Photo Active Compounds (PAC) for i-line and g-line photoresists

 

Photo Initiators

Photo Initiators are a major constituent of photoresists, the materials used to create high precision lines for components such as silicon chips and LCDs. In the presence of light, photo initiators generate free radicals which initiate the polymerisation that sets the resist.

UV absorbance with very high visible transmittance to enable color-free curing of photoresists for high-end applications such as LCD insulators, black column spacers, black matrices and organic insulators. Full technical details including data comparisons with the industry-leading reference photoinitiators are available.

 

Photo Acid Generators

Photo Acid Generators (PAG) are a major constituent of photoresists, the materials used to create high precision lines for components such as silicon chips and LCDs. In the presence of light, PAGs produce cations (acid) to initiate the polymerisation that sets the resist. KISCO manufactures two PAGs (K-NIT-01 and K-NIT-02), the technical specifications for which are shown below.

 

K-NIT-01

  • Appearance: white powder
  • Purity (HPLC at 254nm): >99.5%
  • Melting Point: 213 °C
  • Moisture content: <0.5%

 

K-NIT-02

  • Appearance: yellow powder
  • Purity (HPLC at 254nm): >99.5%
  • Melting Point: 189 °C
  • Moisture content: <0.5%

 

For more information, contact us at kisco@kyungin.co.kr.